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Product name Product description Main applications and fields Wavelength
Xenon short arc lamps for cinema projectors Cinema Xenon lamp for Barco projector USHIO is the only producer to have every one of its high-intensity, high-reproducibility xenon lamps for digital cinema projectors certified by all digital cinema projector manufacturers. With a spectral distribution close to that of sunlight, these xenon lamps are optimized for use in cinema projectors. Boasting the industry's highest quality, they are favored in theaters worldwide.
Cinema Xenon lamp for NEC projector USHIO is the only producer to have every one of its high-intensity, high-reproducibility xenon lamps for digital cinema projectors certified by all digital cinema projector manufacturers. With a spectral distribution close to that of sunlight, these xenon lamps are optimized for use in cinema projectors. Boasting the industry's highest quality, they are favored in theaters worldwide.
Cinema Xenon lamp for SONY projector USHIO is the only producer to have every one of its high-intensity, high-reproducibility xenon lamps for digital cinema projectors certified by all digital cinema projector manufacturers. With a spectral distribution close to that of sunlight, these xenon lamps are optimized for use in cinema projectors. Boasting the industry's highest quality, they are favored in theaters worldwide.
picoexplorer_pas110 PiCOEXPLORER PAS-110, PHOTO ABSORBANCE SENSOR The USHIO PiCOEXPLORER™ model PAS-110 is a compact laboratory research device that dramatically improves the efficiency of experiments in seconds in just 3 EASY steps. The PiCOEXPLORER can be easily controlled by a smartphone or tablet mobile device. This analytical tool allows for quick concentration measurement and detection of protein, nitrite ion concentration, heavy metals, endocrine disruptors, and DNA through colorimetric assays or reagents. The PiCOEXPLORER enables concentration measurement and analysis of a sample in an unopened PCR tube, and thus, does not require use of a pipette. In addition, it incorporates a communication function that allows the user to operate PiCOEXPLORER via a smartphone or tablet. Measurements can be saved in the application and/or uploaded to a computer. Therefore, the PiCOEXPLORER can greatly reduce both the time and the labor required for measurements, making it a great contribution to improve laboratory efficiency. ■Brochure: PiCOEXPLORER ■Manuals for users in U.S and Canada ■Manuals for users in Thailand
IRED (InfraraRed Emitting Diodes) High output is achieved through the use of the unique domed-chip formation technology. And an excellent beam shape is provided by precision lens (package) design technology. enable a suitable product selection as the light source for NC machine tools, robots, ophthalmoscopes and position detection equipment.
Visible inspection light source 「230VILS」 Making detailed inspection easier. A new light source unit with a lamp well suited to visual inspection.

Catalog PDF(490KB)

Large field stepper UX-5 Series UX-7 Series Large field stepper UX-5 Series UX-7 Series

Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

【Component Technology】
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

Full-field projection aligner UX-4 Series Full field projection aligner UX-4 Series

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Contact/proximity aligners UX-3 Series Contact/proximity aligners UX-3 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Manual type contact/proximity aligners UX-1 Series Manual type contact/proximity aligners UX-1 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Roll-to-roll lithography tool UFX Series Roll to roll lithography tool UFX Series

Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

EUV light source (for photo mask inspection and various technologies development) EUV light source (for photo mask inspection and various technologies development) The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies.
Excimer lamps/Excimer irradiation unit Excimer lamps/Excimer irradiation unit Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light.
Light source unit for printable patterning VUV-Aligner Light source unit for printable patterning VUV-Aligner The world's first VUV lamp-type collimated light aligner The hydrophilic patterning technique using VUV irradiation achieves high-precision pattern formation that substantially reduces the number of processes compared to conventional lithography while providing finer pattern formation than that obtained with printing techniques. This paves the way for new applications such as organic transistors, wearable sensors and biochips. Th newly developed high-intensity collimated pulse light source system (patent pending) achieves 5/5* µm L/S (line/space) resolution. Contact us regarding availability for large surface areas. * Using resist TArF-P6111 from Tokyo Ohka Kogyo Co., Ltd. (film thickness: 260 nm)
UV photoresist curing systems Unihard® UV photoresist curing systems Unihard This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing and burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing.
Charge neutralization systems Charge neutralization systems Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing.
UV instant curing equipment Unicure® System UV instant curing equipment Unicure System High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required)
LED spot UV irradiation unit SPL-2 LED spot UV irradiation unit SPL-2 This spot cure series LED type has over 30 years of actual results. By taking advantage of our optical technology developed up to now, we provide solutions to problems that could not be solved with conventional LED types. We propose products tailored to your needs.
Spot UV irradiation units Spot Cure® Series Spot UV irradiation units Spot Cure Series The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions.
Light source unit for scientific use Optical Modulex Light source unit for scientific use Optical Modulex This desktop light source unit provides simple collimated IR, UV and visible light, and is ideal for spectrometry and solar cell evaluation. All models have adjustment-free optical lamp axes for highly collimated, high-power light source experiments on the desktop.
Light source unit for inspection illumination Optical Modulex Light source unit for inspection illumination Optical Modulex Equipped with a high-intensity UV lamp, it provides high-precision collimated irradiation indispensable for inspection tasks. The desk-type light source unit has a track record of actual results for over 15 years as ideal for visual inspection of glass, film and lenses (and is the inspection light source recommended by the Glass Manufacturer's Association).
84 results found. Displaying results1-21
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