The coater enables photoresist applications on (3D-structured) substrate surfaces with concavity and convexity, something that has been impossible to achieve with conventional spin coaters.
Presents lamps and systems used to biotechnology and MEMS
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The coater enables photoresist applications on (3D-structured) substrate surfaces with concavity and convexity, something that has been impossible to achieve with conventional spin coaters. |
The system instantaneously bonds the glass and PDMS (silicon rubber) that form the µTAS substrate, using vacuum UV light instead of adhesives. |
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This exposure system is equipped with an equivalent-size optical projection exposure system, with specifications to suit 20mm and up to Φ8-inch wafer and a minimum of 5µmL/S. |