Skip to contents



HOME > Product Information > Choose from our List of Products > Lamps and Light Sources
View contents

Lamps and Light Sources

Presents Ushio's 17 lamp and light source products in six categories


Discharge lamps

These high-intensity lamps have a long life and constant radiation intensity. They make effective use of 436nm, 405nm and 365nm ultraviolet rays.


These lamps have a wide linear spectrum in the ultraviolet range and are used in various photochemical areas such as UV hardening and drying.


These linear-spectrum light sources provide strong 185nm and 254nm radiation. They are used to promote oxidation reactions, together with the generation of ozone through UV irradiation.


These lamps feature both the wide spectrum of xenon lamps and the high energy of ultra high-pressure UV lamps.


These are projector lamps that have been developed based on ultra high-pressure UV lamps. They have a compact design, a high level of intensity, very good reliability and minimal flickering.


These high-intensity, point-source lamps are exhausted using xenon gas. Their spectrum is the closest artificial light source to natural sunlight. Offer exceptional color representation.


Exhausted with xenon gas, these lamps offer instantaneous, high-luminance flux and facilitate repeated light emissions. These lamps are used in a variety of applications, including image processing and photoreactivity.


These compact light sources have a built-in condenser mirror, suitable for obtaining light of exceptional color representation, which is a core function of xenon lamps.


These lamps efficiently emit vacuum ultraviolet rays at wavelengths of 180nm or less.


Exhausted with the rare gas xenon, these are clean lamps that contain no mercury. They are used for applications such as CCD scans for reading text.



Halogen lamps

These lamps offer exceptional color representation and have been used in shops, outdoor stages, studios and stage lighting. A wide range of products are available that can be used for general lighting to special applications.


The wavelengths that span the range from the visible to the infrared regions offered by these lamps are used in diverse applications, including special lighting, analysis, measurement and optical treatment.


These lamps use light as a heat source. They have very good features not found in other lights, such as superior flexibility and controllability, as well as a high level of efficiency and cleanliness. They also have a compact and lightweight design.


 

LED

LED

These lamps feature the properties of superior light-emitting efficiency and long operating life. There are high expectations of these products as fourth-generation lamps.


 


Laser

The excimer laser unit for lithography has been an essential part of semiconductor manufacturing around the world, both quantitatively and qualitatively.


 

Extreme ultraviolet (EUV)

This light source emits extreme ultraviolet rays with a wavelength of 13nm. It has been developed as a lithographic light source for use with semiconductors succeeding the KrF/ArF laser.