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Super High-Pressure UV Lamps

These lithography UV lamps were jointly developed with device manufacturers in response to their increasingly diverse needs, and have earned high acclaim as well as user trust.
Our extensive product lineup ranges from the 100W to 35kW classes. We offer optimum light sources to bolster your productivity and yield ratio. We can also develop lamps to suit new devices developed by your company.

Characteristics

Optimum UV wavelength for photolithography light source

Ushio's super high-pressure UV lamps have been developed utilizing the three wavelengths of UV rays (436nm, 405nm and 365nm). The lamps are highly illuminant light sources that offer long life and stable radiation intensity.

Spot light source that maximizes optical potential

Since the arc size of the lamps is extremely close to that of a point light source, the light is readily converged and diffused optically. These lamps offer uniform intensity distribution.

A wide range of lamp outputs to suit the purposes, such as semiconductors, liquid crystal, color filters, PDP, and circuit printing on printed substrates

Our lamps come in a broad range of sizes, from the compact (100W class) to the super-sized (35kW class), responding to rising demands for light intensity suited for printing circuits and patterns.

High intensity that maximizes the potential of existing devices

Productivity can be enhanced simply by using high-intensity lamps. This serves to meet the need to improve the throughput of existing devices.
*Products of some device manufacturers may require modification.

Lamp development to meet the required wavelengths

Our Company develops lamps that are ideally suited to the devices developed by our customers. Please contact us for details.

UV life span characteristics

Main data

Spectral distribution (super high-pressure UV lamps)

Spectral distribution (deep UV lamps)

Major Applications

  • Light source for forming semiconductor circuits
  • Light source or forming liquid crystal patterns
  • Light source for forming color filter patterns
  • Light source for forming plasma display patterns
  • Light source for forming printed substrate circuits
  • Light source for forming MEMS patterns
  • Other new uses for exposure

Guidance on our lighting devices

Our Company offers power sources for lighting that suit a wide range of uses from lithography to inspection and testing.

Click here for details on multipurpose light source equipment Optical Modulex

Click here for details on multipurpose uniform irradiation unit Multilight/ lamp houses

Click here for details on various lithography exposure systems

For further information, please contact:

Tokyo Tel: +81 3-3242-5115, Fax: +81 3-3242-2700
Osaka Tel: +81 6-6306-5711, Fax: +81 6-6306-5718

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