These high-intensity lamps have a long life and constant radiation intensity. They make effective use of 436nm, 405nm and 365nm ultraviolet rays.
Presents optical products used in semiconductor manufacturing processes
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These high-intensity lamps have a long life and constant radiation intensity. They make effective use of 436nm, 405nm and 365nm ultraviolet rays. |
These lamps use light as a heat source. They have very good features not found in other lights, such as superior flexibility and controllability, as well as a high level of efficiency and cleanliness. They also have a compact and lightweight design. |
![]() The equipment emits large volumes of pulsating light in short intervals of several milliseconds. It enables processing within a small thermal budget, as only the surface temperature of the irradiated object increases. |
These lamps efficiently emit vacuum ultraviolet rays at wavelengths of 180nm or less. |
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These easy-to-use spot UV exposure systems feature a built-in UV lamp. A diverse range of options is available to suit varying production lines and work pieces, including lenses and units. |
The system is used for various applications such as enhancing plasma resistance during dry etching, facilitating photoresist degassing before ion implantation, preventing photoresist burning, erasing charges and stresses, and low-k curing. |
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Presents diverse exposure systems, including projection exposure systems (single-sided, simultaneous and step-and-repeat for large-area projection) and proximity projection systems |
Presents visual inspection systems for flexible printed boards (FPBs) and other circuits and glass surfaces |
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Presents accurate and easy-to-use measuring systems for light volume and intensity, developed from the user's point of view using our expertise as a light source manufacturer |