Light source unit for printable patterning VUV-Aligner
- MEMS, Electronic Components
- Liquid Crystal Display
- Printed Circuit Board and PKG
- Automotive and Marine
- Biology and Chemistry
The world's first VUV lamp-type collimated light aligner The hydrophilic patterning technique using VUV irradiation achieves high-precision pattern formation that substantially reduces the number of processes compared to conventional lithography while providing finer pattern formation than that obtained with printing techniques. This paves the way for new applications such as organic transistors, wearable sensors and biochips.
Th newly developed high-intensity collimated pulse light source system (patent pending) achieves 5/5* µm L/S (line/space) resolution. Contact us regarding availability for large surface areas.
* Using resist TArF-P6111 from Tokyo Ohka Kogyo Co., Ltd. (film thickness: 260 nm)
Principle 1. Hydrophilicity
Principle 2. Comparison of various molecular binding and photon energies
* This graph simply compares the magnitude of light energy to binding energy, but does not indicate whether irradiation exceeding the binding energy will result in dissociation. Light absorption also requires conditions such as dissociative type excitation potential.
Hydrophilicity Example 1. Water Contact Angle Variation
Irradiation time: 10 s, Sample: Non-alkali glass, Atmosphere: air, Irradiation distance: 2 mm
Hydrophilicity Example 2. Plastic Surface Modification
Photo of immobilized gold nanoparticles in a dispersed state in a monolayer: Professor Takashi Yasuda, Faculty of Biological Function Application Engineering, Life Graduate School of Engineering, Graduate School of Kyushu Institute of Technology
Visualization of the fluorescence dye (TAMRA) pattern following VUV irradiation of AHAPS-SAM through a photomask.* AHAPS: N-(6-aminohexyl)-aminopropyltrimethoxysilane
VUV irradiation, 2 minutes
10nmSiO2 (thermal oxide film) / Si
Fluorescence dye TAMRA
Irradiating the surface of an aqueous SAM (self-assembled monolayer) through a photomask with VUV light. Forming a hydrophilic pattern in the VUV-irradiated area. Forming a 5um L/S by applying conductive nanoink only to the hydrophilic area.
Conductive Ag nanoink pattern (20um gap) on the surface of the SAM film
|Equipment type||Collimated, high-resolution type||High-intensity, large area type|
|Mask size||4 inches|
|Substrate size||30 mm dia.||76 × 26 mm*1|
|Wavelength||150 to 200 nm*2
|Optics image||Collimated light
|Manual alignment accuracy*3||Yes (1) XYZθ stages, (2) Alignment microscope|
|Print gap method||Spacer wall method|
|Utilities||100 V AC|
|N2: 10 NL/min||N2: 4 to 10 NL/min|
|－||Enclosure ozone exhaust 1 to 2 m3/min|
|Options||－||Ozone filter, Illumination meter|
*1. Large-area support available separately.
*2. This is for reference. Spectroscopic measurements in the VUV range are difficult, but the matter is under cooperative study with research institutes.
*3. Details about auto alignment, auto transfer carrier and etc. are available upon request.
Installed light source
What is VUV?
Ultraviolet light with wavelengths shorter than 200nm is referred to as "vacuum ultraviolet" (VUV). While such wavelengths consist of high-energy photons, they are quickly absorbed by air at atmospheric pressure.