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Product name Product description Main applications and fields Wavelength
Microfabrication Services Microfabrication service using Ushio's "optical technologies", Using fine patterning techniques based on Ushio's lithographic technology, Ushio offers fabrication of various shape types and optical elements for a variety of applications.
Large field stepper UX-5 Series UX-7 Series Large field stepper UX-5 Series UX-7 Series

Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

【Component Technology】
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

Full-field projection aligner UX-4 Series Full field projection aligner UX-4 Series

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Contact/proximity aligners UX-3 Series Contact/proximity aligners UX-3 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Manual type contact/proximity aligners UX-1 Series Manual type contact/proximity aligners UX-1 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Roll-to-roll lithography tool UFX Series Roll to roll lithography tool UFX Series

Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

EUV light source (for photo mask inspection and various technologies development) EUV light source (for photo mask inspection and various technologies development) The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies.
Light source unit for printable patterning VUV-Aligner Light source unit for printable patterning VUV-Aligner The world's first VUV lamp-type collimated light aligner The hydrophilic patterning technique using VUV irradiation achieves high-precision pattern formation that substantially reduces the number of processes compared to conventional lithography while providing finer pattern formation than that obtained with printing techniques. This paves the way for new applications such as organic transistors, wearable sensors and biochips. Th newly developed high-intensity collimated pulse light source system (patent pending) achieves 5/5* µm L/S (line/space) resolution. Contact us regarding availability for large surface areas. * Using resist TArF-P6111 from Tokyo Ohka Kogyo Co., Ltd. (film thickness: 260 nm)
Multipurpose exposure unit Deep UV Multilight Multipurpose exposure unit Deep UV Multilight The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications.
Multi-purpose exposure unit (Multilight) Multipurpose exposure unit Multilight “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product.

Super high-pressure UV lamps (to 500 W) Super high-pressure UV lamps (~500W) Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life. Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained.
Super high-pressure UV lamps (500 W to 35 kW) Super high-pressure UV lamps (500W~35kW) Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. The Operating Manual is Here (requires member registration)
Deep UV lamps Deep UV lamps These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps. They feature far-ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.
High power UV laser diode High power UV laser diode

This CAN-type multi-mode blue-violet laser achieves high output (150 mW to 1 W) and long lifespan (10,000 operating hours). This light source is ideal for direct image exposure systems for PCBs, and for medical, bio-medical and measurement applications.
*This is The USHIO OPTO SEMICONDUCTORS, INC's product.

14 results found. Displaying results1-14
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