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Main applications and fields
Lineup of Inverter Prototypes for Experiment and Evaluation
We have lined up inverter prototypes that are compatible with a wide range of power and size excimer light 172nm/222nm lamps.
It is designed to change output power, frequency, etc. and is optimal for experiments and evaluations.
We offer this lineup with quick delivery.
Technology Introduction Page
For more details about this technology, please inquire at this page
Excimer lamps/Excimer irradiation unit
Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds.
Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light.
Charge neutralization systems
Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing.
Super high-pressure UV lamps (~500W)
Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life.
Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained.
Deep UV lamps
These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps.
They feature far-ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.