Products
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Atmospheric Pressure Plasma Irradiation Device | Easier dry cleaning We have developed an Atmospheric Pressure Plasma Irradiation Device that combines our own reactor structure with the high-frequency power supply technology cultivated for excimer lamps. |
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Laser Diodes(LD) | With over 40 years of considerable experience in photonics industry, Ushio Inc., provides varies products selection in a wide wavelength range from violet to infrared for a broad range of applications such as display, medical, industrial tools(sensor and leveler), printer and more. |
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Large field stepper UX-5 Series UX-7 Series | Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates. |
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Full field projection aligner UX-4 Series | This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner. |
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Roll to roll lithography tool UFX Series | Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology. |
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Excimer lamps/Excimer irradiation unit | Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. * * * * For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact : Sales Department, XEFL BU, Light Source Business Division TEL: +81-3-5657-1016 / E-Mail: care222_sales@ushio.co.jp |
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Spot UV irradiation units | The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions. |
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Multipurpose exposure unit Deep UV Multilight | The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications. |
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Super high-pressure UV lamps (500W~35kW) | Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. ■The Operating Manual is Here (requires member registration) ■The Frequently Asked Questions is Here |
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Deep UV lamps | These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps. They feature mean(middle) ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography. |
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Flash lamp annealer | Flash lamp annealing allows very short heating processes as quick as one millisecond. UV to visible wavelength light emitted from the flash lamp can concentrate heat on a substrate (material) surface so that the thermal influence on the underlying film or substrate can be extremely small compared with conventional heat sources. This millisecond surface heat treatment is becoming an essential technology for future device developments such as zero diffusion of semiconductor implanted layers and thermal budget reduction. Flash lamp heating is also used to produce reactions such as crystallization, bonding, peeling, decomposition and curing. These characteristics are effectively applied in various research and development applications such as Si wafers, SiC wafers, glass, plastic films and other flexible substrates, as well as in production (manufacturing) line applications. We welcome requests for experimental demonstrations. Please feel free to contact us. |
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UV-LED uniform surface illumination light source UniField | - This UV LED irradiation unit is available with a selection of multiple wavelengths for large-area, high-intensity and highly uniform irradiation. - Ushio's proprietary installed lens minimizes the illuminance loss due to increased irradiation distance. Proper irradiation is possible without fine adjustment for workpieces having varying thickness. - Our lineup includes 100, 150, and 200 standard sizes ・Multiple mixed wavelength type designs are also available. |
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UV irradiance meter UIT-201 | The Unimeter series was developed based on our experience and expertise as a manufacturer of optical equipment. These compact optical measuring instruments are genuinely easy-to-use from the user's standpoint. These compact UV meters are used to manage the intensity of a range of instruments, including irradiation systems, as well as UV curing, cleansing and sterilizing systems. ■ Troubleshooting is Here (requires member registration) |
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Accumulated UV meter UIT-250 | The Unimeter series was developed based on our experience and expertise as a manufacturer of optical equipment. These compact optical measuring instruments are genuinely easy-to-use from the user's standpoint. These compact UV meters are used to manage the intensity of a range of instruments, including irradiation systems, as well as UV curing, cleansing and sterilizing systems. ■ Troubleshooting is Here (requires member registration) |
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Super-thin palm top UV irradiance meter UIT-θSeries | This wireless LED-dedicated irradiance meter is only 4.9 mm thick. Measures optical film coatings, adhesion of precision optical parts and lenses, and UV printing processes between light source and object even in hard-to-reach locations. ■ Operating Manual and Troubleshooting are Here (requires member registration) |
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Spectro-reflectance meter URE-50 | Instantly measures spectral reflectance (from ultraviolet to near-infrared) of surfaces with up to ±R50 mm curvature as well as of flat surfaces. Despite their compact size, Ushio's unique measurement instruments support measurement of large products. ■ Operating Manual and Troubleshooting are Here (requires member registration) |
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Spectral radiometer USR-45 Series | Ushio's irradiance meters can measure absolute values based on the photometric standard lamp established by the National Institute of Advanced Industrial Science and Technology. Measures a broad range of bands including UV, visible and infrared light, and various light sources such as steady, flashing and LED lights ■ Operating Manual and Troubleshooting are Here (requires member registration) |
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