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- 投影・バックライト
2011.3 SPIE Advanced Lithography 2011
Tin LDP Source Collector Module (SoCoMo)ready for integration into Beta scanner 2011
- 投影・バックライト
2011.3 SPIE Advanced Lithography 2011
Development of debris-mitigation toolfor HVM DPP source 2011
- 投影・バックライト
2011.3 SPIE Advanced Lithography 2011
Sn film and ignition control for performance enhancementof laser-triggered DPP source * 2011
- 投影・バックライト
2011.3 Proceedings of SPIE (SPIE Advanced Lithography 2011)
Regeneration of imprint molds usingvacuum ultraviolet light 2011
- 投影・バックライト
2010.9 Reprinted by permission from Nature Photonics Vol.4, pp.767-770, November 2010 Copyright: Macmillan Publishers Limited
100 mW deep-ultraviolet emission fromaluminium-nitride-based quantum wells pumped
by an electron beam 2011