SAM patterning

Irradiating the surface of an aqueous SAM (self-assembled monolayer) through a photomask with VUV light. Forming a hydrophilic pattern in the VUV-irradiated area. Forming a 5um L/S by applying conductive nanoink only to the hydrophilic area.
Conductive Ag nanoink pattern (20um gap) on the surface of the SAM film