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Fabrication process of flexibly patterned grating by interference lithography system with automated beam alignment module

The R&D Department of Ushio Inc. presented on the performance and applications of their novel interference lithography system under development at SPIE Advanced Lithography and Patterning 2023. This innovative device is equipped with two rotating arms and can automatically control the slant angle (±25 degrees) and pitch (150 nm–500 nm) of the formed gratings. In addition, it features two light sources at 266 nm and 355 nm, enabling it to accommodate a wide range of photo-resist materials. The system includes a high-precision stage with 1 nm accuracy, which allows for overlapping scan exposures and thus the production of seamless gratings. This device has potential applications in the fabrication of various advanced devices, such as liquid crystal-based optical switches and holographic devices for AR and VR, and it attracted significant attention from the audience. 



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