Society of Photo-Optical Instrumentation Engineers (SPIE)
16 March 2023
High precision grating of waveguide combiner with scanning overlapped phase interference lithography
Shinji Orihara,1 Takuro Taniguchi,1 Kentaro Nomoto,1 Yohei Nawaki,1 Kazuyuki Tsuruoka1
1Ushio Inc. (Japan)
We have developed Scanning Overlapped Phase Interference Lithography (SOPHIL) system consisting of precisely controlled work-stage with static accuracy of 1 nm, and collimated laser beams with wavelength of 266 nm. SOPHIL method is a new technology. As the first step, a spot fringe pattern generated by two-beam interference is scanned direction along the grid on the wafer. As the second step, the spot is moved just the integer multiple length of its fringe period, then the spot is exposed again over the 1st fringe. The averaging effect by our SOPHIL system reveals that line edge roughness is less than 3% at 3σ/ave.
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