Ushio's Technology Periodical, "Light Edge"

Ushio's light technology information
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LIGHT EDGE No.42

LIGHT EDGE No.41

LIGHT EDGE No.40

LIGHT EDGE No.39

LIGHT EDGE No.37

LIGHT EDGE No.35

LIGHT EDGE No.33

LIGHT EDGE No.32

LIGHT EDGE No.31

LIGHT EDGE No.29

LIGHT EDGE No.28

LIGHT EDGE No.26

LIGHT EDGE No.24

LIGHT EDGE No.22

LIGHT EDGE No.21

LIGHT EDGE No.20

LIGHT EDGE No.16

LIGHT EDGE No.14

LIGHT EDGE No.13

LIGHT EDGE No.9

LIGHT EDGE No.8

LIGHT EDGE No.3

LIGHT EDGE No.2

COMPACT HID LAMPS FOR LIQUID CRYSTAL PROJECTORS

特集 第7回光源の科学と技術に関する国際会議

直流点灯によるショートアークメタルハライドランプの寿命特性の改善
“LIFE PERFORMANCE IMPROVENMENT of THE SHORT ARC METAL HALIDE LAMP by DC OPERATION”

特集 第7回光源の科学と技術に関する国際会議

高分光放射輝度光源
HIGH RADIANCE LAMPS

特集 第7回光源の科学と技術に関する国際会議

高効率カドミウムイオンランプ
CADMIUM ION LAMPS WITH HIGH RADIANT EFFICIENCY

特集 第7回光源の科学と技術に関する国際会議

高温におけるWワイヤーの引っぱり強度
TENSILE STRENGTH OF W-WIRE AT HIGH TEMPERATURES

特集 第7回光源の科学と技術に関する国際会議

LOW POWER COMPACT ELECTRODELESS LAMPS

(注目すべき発表論文<社外>)

LOW POWER COMPACT ELECTRODELESS LAMPS

(注目すべき発表論文<社外>)

PROGRESS IN
SULFUR LAMPS TECHNOLOGY

(注目すべき発表論文<社外>)

THE INFRA-RED SUPPRESSION IN
INCANDESCENT LIGHT
FROM SUBMICRON HOLES

Journal of Non-Crystalline Solids 179 (1994)260-275

Vacuum ultraviolet-induced strain in vitreous silica used
for xenon lamp bulbs

Advanced Solid-State Laser Optical Society Of America

Development of a hiigh-power,high-repetition rate, diode-phmped, deep UV Iaser system

CLEO®’98 Conference on Lasers and Electro-Optics

ウシオ電機 ライトエッジ No.14 | Long-term operation of CsLiB6O10 crystal in fourth-harmonic generation of Nd:YAG laser

CLEO®’98 Conference on Lasers and Electro-Optics

ウシオ電機 ライトエッジ No.14 | 200mW 192nm generation using CsLiB6O10 crystal

4th International Symposium on 193nm Lithography

ArF Excimer Laser for 193 nm Lithography

Advanced High-Power Lasers and Applications

High power, narrowband, DUV laser source
by frequency mixing in CLBO

99International Conference
Journal fo Korean Association of Crystal Growth
Vol. 9, No.4(1999) 424-431

TSSG-pulling of sillenite Bi12TiO20 for EOS application

TPCAショー2000セミナー

Most Advanced Technology Trend
in
Step-&-Repeat Projection Exposure System
for Printed-Circuit Boards

IPC Printed Circuits Expo 2001技術フォーラム
Presented at IPC Printed Circuits EXPO® 2001
www.ipcprintedcircuitexpo.org

High Overlay Accuracy Using Scaling Method in PWB Photolithography

IPC Printed Circuits Expo 2001技術フォーラム
Presented at IPC Printed Circuits EXPO® 2001
www.ipcprintedcircuitexpo.org

The Latest Alignment Technology in PCB Step-and-Repeat
Projection Exposure System

13回結晶成長国際会議

Cz-Growth of Optical Nonlinear Crystal CsLiB6 O10

第50回高分子討論会

Nafion® Based Polymer Electrolyte Membranes For Improved
Direct Methanol Fuel Cell Performance.

2001 International Conference on Solid State Devices and Matelials,
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials,Tokyo,2001,pp.182-183

A-5-3
Flash Lamp Anneal Technology for Effectively Activating Ion Implanted Si

2001 International Conference on Solid State Devices and Matelials,
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials,Tokyo,2001,pp.520-521

C-8-1
Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded
LSIs and 1Tr FeRAM Devices

第9回 電子回路世界大会

Predominance of Projection Exposure System to
Contact Exposure System for the Manufacture of Printed Wired Board

Time-dependent modeling of a pulse-current-operated
EUV radiation source

IAS(IEEE Industry application society)2004 Annual Meeting

Recent progress on UV lamps for industries

2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources)

Study of HID lamp by a 3-D and time-dependent model:
determination of temporal distributions
of electrode temperatures

2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources)

Current waveform optimization
of AC-operated short arc ultra high pressure mercury lamps
for projection applications

2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources)

Electrode stabilized Xe filled Flash Lamp as a DUV
and VUV Point Source

ヨーロッパ太陽電池国際会議

FORMATION OF POLYCRYSTALLINE Si FILMS OVER 3 µm
IN THICKNESS ON QUARTZ SUBSTRATES
BY FLASH LAMP ANNEALING

2007.11 Fifth international symposium on control of semiconductor interfaces

Role of UV Irradiation during Si Etching Process in Chlorine Plasma

2008.6 ICOPS2008 (35th IEEE International Conference on Plasma Science)

MODELING OF A PROJECTOR LAMP OPERATED
BY A U-DRIVE PULSE POWER SOURCE

2008.6 25th International Conference of Photopolymer Science and Technology (ICPST-25)

Techniques for Measuring Rate Constants for Acid
Generation from PAG (Photo Acid Generator)
during ArF Exposure

2008.6 25th International Conference of Photopolymer Science and Technology (ICPST-25)

A Study of Photoresist Pattern Freezing for Double Imaging
using 172nm VUV Flood Exposure

環瀬戸内海光源研究会

Modeling of a Projector Lamp Operated
by a U-Drive Pulse Power Source

SPIE Lithography 2013

A Reality In The Making
Progress in LDP Technology

レーザーディスプレイ国際会議

Multi-Watt Class, Red, Green, and Blue, Direct Emitting and
Frequency Doubled Laser Diodes for Display Applications

レーザー学会学術講演会 第33回年次大会

Lasers for Display and Lighting … The Time is Now

The 10th Conference on Lasers and Electro-Optics Pacific Rim

Micro-dispensing for three-dimensional direct
fabrication of laser waveguides

平成25年(第66回)電気関係学会九州支部連合大会

A monolithic PDMS spectroscopic analyzer

ホログラフィック・ディスプレイ研究会

Surface Plasmon Resonance Sensor
for Detection of β-Agonists

Micro TAS2014

SIMULTANEOUS MEASUREMENT OF
3D INTERFACIAL GEOMETRY
AND INTERNAL FLOW STRUCTURE OF
MICRO DROPLET USING DIGITAL
HOLOGRAPHIC MICROSCOPY

The 21st International Display Workshop

Difference in Speckle Reduction
by Wavelength Diversity
between Two Types of Screen

Applied Physics Letters

Chemical surface modification on polytetrafluoethylene films vacuum ultraviolet excimer lamp irradiation in ammonia gas atmosphere

Three-Dimensional Modeling of a Direct
Current Operated Hg-Ar Lamp

Self-Consistent Model of HID Lamp
for Design Applications

In situ measurements of electrode work
functions in free-burning arcs during
operation at atmospheric pressure

A study of radial cataphoresis and ion densities
in high power density Hg-Ar discharges

Mechanisms of sound generation during flash lamp operation

Delta-Aminolevulinic Acid-Based Photodynamic Therapy
for Acne on The Body

Photodynamic Therapy for Cancer Cells Using a Flash
Wave Light Xenon Lamp.

2006.9 21st European Photovoltaic Solar Energy Conference

A NEW TYPE POLY-Si PREPARED BY FAST LAMP ANNEALING
OF Cat-CVD a-Si AND ITS DEFECT PASSIVATION
BY HIGH PRESSURE WATER VAPOR ANNEALING

2006.10 4th International Conference on Hot-Wire CVD(Cat-CVD)Process

Poly-Si Films with Long Carrier Lifetime Prepared by Rapid
Thermal Annealing of Cat-CVD Amorphous Silicon Thin Films

2006.11 MHS2006&Micro-Nano COE

Surface modification of DMFC using ultra-low energy electron
beam irradiation system with silicon base membrane

2009.2 日本化学会欧文誌Vol.82

Photochemical Removal of NO, NO2, and N2O by 146nm Kr2
Excimer Lamp in N2 at Atmospheric Pressure

2009.3 日本応用物理学会欧文誌

Photochemical Removal of SO2 and CO2
by 172nm Xe2 and 146nm Kr2 Excimer Lamps
in N2 or Air at Atmospheric Pressure

2010.1 Applied Physics Letter

Stress-Enhancement in free-standing Si pillars through
nonequilibrium dehydrogenation in SiN:H
stress-liners by ultraviolet light irradiation

An Introduction to
Large-field Stepper
and
a Full-field Projection Aligner
for 2.5D/3D packaging,MEMS and Discrete devices

2011.3 Proceedings of SPIE (SPIE Advanced Lithography 2011)

Regeneration of imprint molds using
vacuum ultraviolet light

2010.9 Reprinted by permission from Nature Photonics Vol.4, pp.767-770, November 2010 Copyright: Macmillan Publishers Limited

100 mW deep-ultraviolet emission from
aluminium-nitride-based quantum wells pumped
by an electron beam

Ultra-Sensitive Absorption Spectroscopy on
lons using UV/VUV Synchrotron Radiation

Japanese Journal of Applied Physics
Jpn. J Appl. Phys. Vol. 39 (2000) pp. 1256-1257
Part 1, No. 3A March 2000
©2000 Public Board, Japanese Journal Applied Physics
Short Note

Thermal Expansion Coefficients of Optical Crystal CsLiB6O10

Water-associated surface degradation of CsLiB6 O10 crystal During harmonic generation in the ultraviolet region

Water-associated surface degradation of CsLiB6O10 crystalduring harmonic generation in the ultraviolet region

Biosensors and Bioelectronics

Highly selective and sensitive detection
of β-agonists using a surface plasmon
resonance sensor based on an alkanethiol
monolayer functionalized on a Au surface

2001 International Conference on Solid State Devices and Matelials

High-Performance Low-k Dielectric using Advanced EB-Cure Process

2011.3 SPIE Advanced Lithography 2011

Tin LDP Source Collector Module (SoCoMo)
ready for integration into Beta scanner

2011.3 SPIE Advanced Lithography 2011

Development of debris-mitigation tool
for HVM DPP source

2011.3 SPIE Advanced Lithography 2011

Sn film and ignition control for performance enhancement
of laser-triggered DPP source *

シネマ/特殊映像/デジタルサイネージ・メディアファサード

Christie AutocalTM