Ushio signed the partnership agreement to co-develop EUV
Ushio, Philips and Jenoptik LOS Signed an LOI to Form a Partnership to Co-develop EUV Sources for Next Generation Semiconductor Lithography
October 30, 2007 - Ushio Inc, Philips and JENOPTIK Laser, Optik, Systeme GmbH announce that they signed an LOI to form a partnership to co-develop EUV (Extreme Ultra Violet) sources, a cutting-edge technology for photolithography of new generation semiconductors.
Together XTREME technologies GmbH (a company in which Ushio and JENOPTIK Laser, Optik, Systeme GmbH each hold a 50% share) and Philips Extreme UV GmbH (a 100% subsidiary of Philips) have developed and shipped EUV sources based on the gas discharge technology principle. They have shipped experimental tools so far and based on this experience, XTREME and Philips delivered alpha tools to leading customers during 2006 and 2007; these tools are mounted on full-field scanners, which can expose 300 mm wafers.
The objectives of the partnership are to speed up the development of EUV lithography and make it practical as the post-ArF laser immersion technology. The speed of introduction depends crucially on the development of high-power light sources. The partnership between XTREME and Philips EUV, which are the only companies world-wide with experience of shipment of commercial EUV sources for exposure tools, will accelerate the speed of development of beta tools and ultimately secure the development and sales of commercial EUV sources.
About USHIO
About Royal Philips Electronics
About JENOPTIK Laser, Optik, Systeme GmbH
JENOPTIK Laser, Optik, Systeme GmbH was founded in 1995, currently has about 580 employees and is part of the Laser & Optics division of the Jenoptik group. Further information on: www.jenoptik-los.com