Ushio's Technology Periodical, "Light Edge"
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Journal of Non-Crystalline Solids 179 (1994)260-275
Vacuum ultraviolet-induced strain in vitreous silica usedAdvanced Solid-State Laser Optical Society Of America
Development of a hiigh-power,high-repetition rate, diode-phmped, deep UV Iaser systemCLEO®’98 Conference on Lasers and Electro-Optics
ウシオ電機 ライトエッジ No.14 | Long-term operation of CsLiB6O10 crystal in fourth-harmonic generation of Nd:YAG laserCLEO®’98 Conference on Lasers and Electro-Optics
ウシオ電機 ライトエッジ No.14 | 200mW 192nm generation using CsLiB6O10 crystalAdvanced High-Power Lasers and Applications
High power, narrowband, DUV laser source99International Conference
Journal fo Korean Association of Crystal Growth
Vol. 9, No.4(1999) 424-431
IPC Printed Circuits Expo 2001技術フォーラム
Presented at IPC Printed Circuits EXPO® 2001
www.ipcprintedcircuitexpo.org
IPC Printed Circuits Expo 2001技術フォーラム
Presented at IPC Printed Circuits EXPO® 2001
www.ipcprintedcircuitexpo.org
2001 International Conference on Solid State Devices and Matelials,
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials,Tokyo,2001,pp.182-183
2001 International Conference on Solid State Devices and Matelials,
Extended Abstracts of the 2001 International Conference on Solid State Devices and Materials,Tokyo,2001,pp.520-521
IAS（IEEE Industry application society）2004 Annual Meeting
Recent progress on UV lamps for industries2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources）
Study of HID lamp by a 3-D and time-dependent model:2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources)
Current waveform optimization2007.5 LS-11(11th Int'l Symp. on the Science and Technology of Light Sources)
Electrode stabilized Xe filled Flash Lamp as a DUV2007.11 Fifth international symposium on control of semiconductor interfaces
Role of UV Irradiation during Si Etching Process in Chlorine Plasma2008.6 ICOPS2008 (35th IEEE International Conference on Plasma Science)
MODELING OF A PROJECTOR LAMP OPERATED2008.6 25th International Conference of Photopolymer Science and Technology (ICPST-25)
Techniques for Measuring Rate Constants for Acid2008.6 25th International Conference of Photopolymer Science and Technology (ICPST-25)
A Study of Photoresist Pattern Freezing for Double Imaging2011.3 SPIE Advanced Lithography 2011
Tin LDP Source Collector Module (SoCoMo)2011.3 SPIE Advanced Lithography 2011
Sn film and ignition control for performance enhancementThe 10th Conference on Lasers and Electro-Optics Pacific Rim
Micro-dispensing for three-dimensional directThe 21st International Display Workshop
Difference in Speckle ReductionIEEE 66th Electronic Components and Technology Conference (ECTC)
Full-Sized Panel Photodesmear for Via Residue Cleaning18th International Symposium on the Application of Laser and Imaging Techniques to Fluid Mechanics
Three-dimensional measurement of micro-multiphase flow using digital holographic microscopy2015 International Conference on Solid State Devices and Materials(SSDM)
Behavior of Si Atoms, Ge Atoms and Vacancies for Flash Lamp AnnealingIMAPS2016 Volume 2016, Issue 1
Improvement of Coherency of the Panel Level Package by Integrated Dry Process2006.9 21st European Photovoltaic Solar Energy Conference
A NEW TYPE POLY-Si PREPARED BY FAST LAMP ANNEALING2006.10 4th International Conference on Hot-Wire CVD(Cat-CVD)Process
Poly-Si Films with Long Carrier Lifetime Prepared by Rapid2006.11 MHS2006&Micro-Nano COE
Surface modification of DMFC using ultra-low energy electron2011.3 Proceedings of SPIE （SPIE Advanced Lithography 2011）
Regeneration of imprint molds using2010.9 Reprinted by permission from Nature Photonics Vol.4, pp.767-770, November 2010 Copyright: Macmillan Publishers Limited
100 mW deep-ultraviolet emission fromJournal of Fluids Engineering Volume 138 Issue 9
Measurement of Viscoelastic Fluid Flow in the Curved Microchannel Using Digital Holographic Microscope and Polarized CameraDigital Holography and Three-Dimensional Imaging 2016
Phase Image-based Particle Tracking Velocimetry using Digital Holographic MicroscopyAMFPD（Int Conf Active-Matrix Flat Panel and Devices）
Formation of nc-Si in SiOx by Flash lamp annelingScientific Reports 6, Article number: 25530 (2016)
Simplified and optimized multispectral imaging for 5-ALA-based fluorescence diagnosis of malignant lesionsApplied Physics Express, Volume 10, Number 3
Deep-ultraviolet polychromatic emission from three-dimensionally structured AlGaN quantum wellsJapanese Journal of Applied Physics
Dynamics of Vacancy and Interstitial Atoms During Crystallization of Amorphous Ge or Si Film by Flash Lamp AnealingApplied Physics Express 10, 2017
Development of polychromatic ultraviolet light-emitting diodes based on three dimensional AlGaN quantum wellsJapanese Journal of Applied Physics
Jpn. J Appl. Phys. Vol. 39 (2000) pp. 1256-1257
Part 1, No. 3A March 2000
©2000 Public Board, Japanese Journal Applied Physics
Short Note
Water-associated surface degradation of CsLiB6 O10 crystal During harmonic generation in the ultraviolet region
Water-associated surface degradation of CsLiB6O10 crystalduring harmonic generation in the ultraviolet region2001 International Conference on Solid State Devices and Matelials
High-Performance Low-k Dielectric using Advanced EB-Cure Process