USHIO

(2015.09)
2015 International Conference on Solid State Devices and Materials(SSDM)

Behavior of Si Atoms, Ge Atoms and Vacancies for Flash Lamp Annealing

A.Heya1, N.Matsuo1, S.Hirano1, Y.Nakamura2, T.Yokomori2, M.Yoshioka2
(1.Univ. of Hyogo, 2.USHIO Inc.(Japan))

SiとGe、固相結晶化と液晶結晶化における原子空孔の挙動の差異を検討し、FLA結晶化を原子空孔を介したSiおよびGe原子の自己拡散で説明した。

Article that discusses an investigation into the behavioral differences of atomic vacancies for solid-phase crystallization and liquid-crystal crystallization of Si and Ge, and explains the self-diffusion of Si and Ge atoms due to atomic vacancies in FLA crystallization.

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