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High-brightness LDP source

 

Ushio has been delivering LDP EUV light sources for EUV mask actinic inspection used in cutting-edge semiconductor processes. Our light source has a proven track record as a highly reliable light source, with field availability exceeding 90%. As a result of design improvements for further improving availability, more than 800h of operation was achieved in in-house evaluations. Also, we are investigating to reduce redundant EUV light that could have a negative impact on inspections. We have been able to reduce redundant EUV light without a significant reduction in brightness by changing the plasma shape through optimization of the trigger laser and rotating electrode.


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