Announcement of Extreme Ultraviolet (EUV) Business

At “2012 International Symposium on Extreme Ultraviolet Lithography” held in Brussels, Belgium from October 1 to October 4, 2012, USHIO made an announcement of stable operation of the EUV light source for the past half year at IMEC(Belgium), an international research institution, experimental results of high output power up to 74W, and verification of feasibility of 250W.

Based on such accomplishments, USHIO will continue promoting the business to achieve mass production of DPP (Discharge Produced Plasma) EUV light source.