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Product description
Main applications and fields
Wavelength
Photo alignment UV irradiation equipment
Ushio's photo-alignment technology makes full use of advanced polarization and optical and mechanical design technologies, enabling us to propose optimal systems to our customers.
We have optical components that are optimal for various material sensitivities, including 254, 313 and 365 nm.
Our systems are also characterized by high exposure and highly uniform irradiation with high-power input.We propose systems that suit customers' work, from small to large.
Excimer lamps/Excimer irradiation unit
Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds.
Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light.
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For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact :
Sales Department, XEFL BU, Light Source Business Division
TEL: +81-3-5657-1016 / E-Mail: care222_sales@ushio.co.jp
Deep UV lamps
These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps.
They feature mean(middle) ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.
