Light Edge, Ushio's Technology Magazine

Presents our technology magazine, Light Edge, which features new optical technologies, research papers and related information with the aim of bridging the industries and academia.

*View all the research papers and information (in Japanese)
*View a list of research papers and information (in English)

SPIE Advanced Lithography 2011（2011.3）
Tin LDP Source Collector Module (SoCoMo)ready for integration into Beta scanner PDF（3.30MB）

SPIE Advanced Lithography 2011（2011.3）
Development of debris-mitigation toolfor HVM DPP source PDF（3.26MB）

SPIE Advanced Lithography 2011（2011.3）
Sn film and ignition control for performance enhancement of laser-triggered DPP source PDF（688KB）

Proceedings of SPIE （SPIE Advanced Lithography 2011）（2011.3）
Regeneration of imprint molds usingvacuum ultraviolet light PDF（1.62MB）

Reprinted by permission from Nature Photonics Vol.4, pp.767-770, November 2010 Copyright: Macmillan Publishers Limited.（2010.9）
100 mW deep-ultraviolet emission fromaluminium-nitride-based quantum wells pumpedby an electron beam PDF（864KB）

Applied Physics Letter（2010.1）
Stress-Enhancement in free-standing Si pillars through nonequilibriumdehydrogenation in SiN:H stress-liners by ultraviolet light irradiation PDF（399KB）

環瀬戸内海光源研究会（2009.11）
Modeling of a Projector Lamp Operatedby a U-Drive Pulse Power Source PDF（510KB）

Photochemical Removal of NO,NO₂,and N₂O by 146nm Kr₂ Excimer Lamp in N2 at Atmospheric Pressure（2009.2） PDF（111MB）

Photochemical Removal of SO₂ and CO₂ by 172nm Xe₂ and 146nm Kr₂ Excimer Lamps in N₂ or Air at Atmospheric Pressure（2009.3） PDF（111MB）

LS-11（11th Int’l Symp. on the Science and Technology of Light Sources）（2007.5）
Study of HID lamp by a 3-D and time-dependent model :determination of temporal distributions of electrode temperatures PDF（1.2MB）

LS-11（11th Int’l Symp. on the Science and Technology of Light Sources）（2007.5）
Current waveform optimization of AC-operated short arc ultra high pressure mercury lamps for projection applications PDF（1.2MB）

LS-11（11th Int’l Symp. on the Science and Technology of Light Sources）（2007.5）
Electrode stabilized Xe filled Flash Lamp as a DUV and VUV Point Source PDF（847KB）

ヨーロッパ太陽電池国際会議（2007年9月）
FORMATION OF POLYCRYSTALLINE Si FILMS OVER 3μm IN THICKNESS ON QUARTZ SUBSTRATES BY FLASH LAMP ANNEALING PDF（1.9MB）

Fifth international symposium on control of semiconductor interfaces（2007.11）
Role of UV Irradiation during Si Etching Process in Chlorine Plasma PDF（805KB）

ICOPS2008（ 35th IEEE International Conference on Plasma Science）（2008.6）
MODELING OF A PROJECTOR LAMP OPERATED BY A U-DRIVE PULSE POWER SOURCE PDF（459KB）

25th International Conference of Photopolymer Science and Technology（ICPST-2008.6 25）
Techniques for Measuring Rate Constants for Acid Generation from PAG（ Photo Acid Generator） during ArF Exposure PDF（1.8MB）

25th International Conference of Photopolymer Science and Technology（ICPST-2008.6 25）
A Study of Photoresist Pattern Freezing for Double Imaging using 172nm VUV Flood Exposure PDF（5MB）

SPIE, 2005 International EUVL Symposium（2005.10）
Xe- and Sn-fueled Z-pinch EUV source development aiming at HVM PDF（2.32MB）

SPIE, 2006 International EUVL Symposium（2006.2）
Development of Xe-and Sn-fueled high-power Z-pinch EUV source aiming at HVM PDF（380KB）

SPIE, 2006 International EUVL Symposium（2006.10）
Development of high-power Sn-fueled DPP EUV source for enabling HVM PDF（1.12MB）

SPIE, 2007 International EUVL Symposium（2007.2）
Development of Sn-fueled high-power DPP EUV source for enabling HVM PDF（554KB）

SPIE, 2007 International EUVL Symposium（2007.10）
High-power DPP EUV source development toward HVM PDF（1.76MB）

2007 International Symposium on Extreme Ultraviolet Lithography（2007.10）
Progress on DPP source development towards HVM PDF（1.1MB）

21st European Photovoltaic Solar Energy Conference (2006.9)
A NEW TYPE POLY-Si PREPARED BY FAST LAMP ANNEALING OF Cat-CVD a-Si AND ITS DEFECT PASSIVATION BY HIGH PRESSURE WATER VAPOR ANNEALING PDF（686KB）

4th International Conference on Hot-Wire CVD(Cat-CVD)Process (2006.10)
Poly-Si Films with Long Carrier Lifetime Prepared by Rapid Thermal Annealing of Cat-CVD Amorphous Silicon Thin Films PDF（192KB）

MHS2006 and Micro-Nano COE (2006.11)
Surface modification of DMFC using ultra-low energy electron beam irradiation system with silicon base membrane PDF（1.6MB）

The 18th International Symposium on Plasma Chemistry(ISPC-2005)
Time-dependent modeling of a pulse-current-operated EUV radiation source PDF （56KB）

IAS (IEEE Industry application society) 2004 Annual Meeting (Octorber, 2004)
Recent progress on UV lamps for industries PDF （478KB）

IEEE TRANSACTIONS ON PLASMA SCIENCE,VOL.34, NO.2,APRIL 2006
Three-Dimensional Modeling of a Direct Current Operated Hg-Ar Lamp PDF （250KB）

IEEE TRANSACTIONS ON PLASMA SCIENCE,VOL.34,No.4,AUGUST 2006
Self-Consistent Model of HID Lamp for Design Applications PDF （241KB）

Journal of Physics D:Applied Physics No.38 (2005)
In situ measurements of electrode work functions infree-burning arcs during operation at atmospheric pressure PDF （370KB）

Journal of Physics D:Applied Physics No.37 (2004)
A Study of Radial Cataphoresis and Ion densities inHigh Power Density Hg-Ar Discharges PDF （306KB）

Review of Scientific Instruments 76,086107(2005)
Mechanisms of sound generation during flash lamp operation PDF （108KB）

Japanese Dermatological Association, THE JOURNAL OF DERMATOLOGY Vol.31 No.12 (December, 2004)
Delta-Aminolevulinic Acid-Based Photodynamic Therapy for Acne on The Body PDF （281KB）

OPTICAL REVIEW (Vol.12,No.3 May/June,2005)
Photodynamic Therapy for Cancer Cells Using a Flash WaveLight Xenon Lamp PDF （153KB）

Electronic Circuits World Convention, ECWC 11 (Octorber, 2002)
Predominance of Projection Exposure System to Contact Exposure System for the Manufacture of Prented Wired Board PDF （404KB）

International Symposium on MEMS (July, 2001)
Modification of Nafion by low dose electron beam exposure for use as a polymer electrolyte membrane for DMFC PDF （343KB）

50th The Society of Polymer Sicence, Japan (SPSJ) Annual Meeting (September, 2001)
Nafion Based Polymer Electrolyte Membranes For Improved Direct Methanol Fuel Cell Performance PDF （363KB）

ISSM (Octorber, 2001)
Advanced EB-Cure Process and Equipment for Low-k Dielectric PDF （496KB）

2001 International Conference on Solid State Devices and Materials (September, 2001)
Flash Lamp Anneal Technology for Effectively Activating Ion Implanted Si PDF （500KB）

2001 International Conference on Solid State Devices and Materials (September, 2001)
Novel PZT Crystallization Technique by Using Flash Lamp for FeRAM Embedded LSIs and 1 Tr FeRAM Devices PDF （546KB）

Journal of Electrochemical Society
Modified Nafion 117 as an Improved Polymer Electrolye Membrane for Direct Methanol Fuel Cells PDF （599KB）

2001 International Conference on Solid State Devices and Materials (September, 2001)
High-Performance Low-k Dielectric Using Advanced EB-Cure Process PDF （448KB）

IPC Printed Circuits Expo 2001 (April, 2001)
High Overlay Accuracy Using Scaling Method in PWB Photolithography PDF （156KB）

IPC Printed Circuits Expo 2001 (April, 2001)
The Latest Alignment Technology in PCB Step-and-Repeat Projection Exposure System PDF （316KB）

The 13th International Conference on Crystal Growth (July, 2001)
Cz-Growth of Optical Nonlinear Crystal CsLiB₆O₁₀ PDF （17KB）

J. Master. Res,. Vol16, No7, Jul 2001 (July, 2001)
Water-associated surface degradation of CsLiB₆O₁₀crystal during harmonic generation in the ultraviolet region PDF （502KB）

TPCA SHOW 2000 in Japan (November, 2000)
Most Advanced Technology Trend in Step--Repeat Projection Exposure System for Printed-Circuit Boards PDF （481KB）

Advanced High-Power Lasers and Applications (November, 2000)
High power, narrowband, DUV laser source by frequency mixing in CLBO PDF （391KB）

99International Conference(June, 1999)
TSSG-pulling of sillenite Bi₁₂Tio₂₀ for EOS application PDF （660KB）

The 1st Asian Conference on Crystal Growth and Crystal (August, 2000)
TSSG of CsLiB₆O₁₀ and CsB₃O₅; their similarity and dissimilarity PDF （660KB）

Japanese Jounal of Applied Physics
Thermal Expansion Coefficients of Optical Crysal CsLiB₆O₁₀ PDF （386KB）

4th International Symposium on 193nm Lithography（1 Jan.～3 Feb. 1999）
ArF Excimer Laser for 193nm Lithography PDF （985KB）

CLEO(R)98 Conference on Lasers and Electro-Optics (May, 1998)
Long-term operation of CsLiB₆O₁₀crystal in fourth-harmonic generation of Nd:YAG laser PDF （272KB）

CLEO(R)98 Conference on Lasers and Electro-Optics (May, 1998)
200mW 192nm generation using CsLiB₆O₁₀crystal PDF （199KB）

Advanced Solid-State Laser Optical Society of America(February, 1998)
Development of a high-power, high-repetition rate, diode-pumped, deep UV laser system PDF （87KB）

Applied Physics letter 68(19)(1966/5)2648-2650
Chemical surface modification on polytetrafluoethylene films vacuum ultraviolet excimer lamp irradiation in ammonia gas atmosphere PDF （67KB）

Journal of Non-Crystalline Solids 179 (1994)260-275
Vacuum ultravioiet-induced strain in vitreous silica used for xenon lamp bulbs PDF （722KB）

Program of the 1996 Division of Atomic,Molecular,and Optical Physics Annual Meeting Bulletin of the American Physical Society Vol.41,No.3,5/15～18(1996)1125 FP45
Ultra-Sensitive Absorption Spectroscopy on lons using UV/VUV Synchrotron Radiation PDF （389KB）

THE 6TH INTERNATIONAL SYMP0SIUM 0N THE SCIENCE＆TECHN0L0GY 0F LIGHT S0URCES
Invited Papers and Abstracts P．275～284（1992）
C0MPACT HID LAMPS F0R LIQUID CRYSTAL PR0JECT0RS PDF （152KB）