Society of Photo-Optical Instrumentation Engineers (SPIE)
16 March 2023
High precision grating of waveguide combiner with scanning overlapped phase interference lithography
Shinji Orihara,1 Takuro Taniguchi,1 Kentaro Nomoto,1 Yohei Nawaki,1 Kazuyuki Tsuruoka1
1Ushio Inc. (Japan)
我々は高精度な大面積ステージとコリメートされた266 nmの光を用いた重ね合わせスキャン干渉露光装置を開発した。重ね合わせスキャン方式とは、干渉縞周期の整数倍だけ露光エリアをシフトさせ、重ね合わせながらφ200 mmウェハ全体をスキャン露光する新しい技術である。多重露光の均一化効果でラインエッジラフネスが3%以下の露光ができていることを明らかにした。
We have developed Scanning Overlapped Phase Interference Lithography (SOPHIL) system consisting of precisely controlled work-stage with static accuracy of 1 nm, and collimated laser beams with wavelength of 266 nm. SOPHIL method is a new technology. As the first step, a spot fringe pattern generated by two-beam interference is scanned direction along the grid on the wafer. As the second step, the spot is moved just the integer multiple length of its fringe period, then the spot is exposed again over the 1st fringe. The averaging effect by our SOPHIL system reveals that line edge roughness is less than 3% at 3σ/ave.
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