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UV search result

Product name Product description Main applications and fields Wavelength
EUV light source (for photo mask inspection and various technologies development) EUV light source (for photo mask inspection and various technologies development) The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies.
Excimer lamps/Excimer irradiation unit Excimer lamps/Excimer irradiation unit Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light.
Light source unit for printable patterning VUV-Aligner Light source unit for printable patterning VUV-Aligner The world's first VUV lamp-type collimated light aligner The hydrophilic patterning technique using VUV irradiation achieves high-precision pattern formation that substantially reduces the number of processes compared to conventional lithography while providing finer pattern formation than that obtained with printing techniques. This paves the way for new applications such as organic transistors, wearable sensors and biochips. Th newly developed high-intensity collimated pulse light source system (patent pending) achieves 5/5* µm L/S (line/space) resolution. Contact us regarding availability for large surface areas. * Using resist TArF-P6111 from Tokyo Ohka Kogyo Co., Ltd. (film thickness: 260 nm)
Light source unit for inspection illumination Optical Modulex Light source unit for inspection illumination Optical Modulex Equipped with a high-intensity UV lamp, it provides high-precision collimated irradiation indispensable for inspection tasks. The desk-type light source unit has a track record of actual results for over 15 years as ideal for visual inspection of glass, film and lenses (and is the inspection light source recommended by the Glass Manufacturer's Association).
Multipurpose exposure unit Deep UV Multilight Multipurpose exposure unit Deep UV Multilight The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications.
Multi-purpose exposure unit (Multilight) Multipurpose exposure unit Multilight “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product.

UV-LED uniform line illumination light source UniLine UV-LED uniform line illumination light source UniLine - Supporting multiple wavelengths, this production line light source is capable of high-intensity, highly uniform UV irradiation. - The proprietary optical design supports various irradiation distances from 10 to 150 mm. - Irradiation length can be customized according to workpiece size and application.
UV-LED uniform surface illumination light source UniField UV-LED uniform surface illumination light source UniField - This UV LED irradiation unit is available with a selection of multiple wavelengths for large-area, high-intensity and highly uniform irradiation. - Ushio's proprietary installed lens minimizes the illuminance loss due to increased irradiation distance. Proper irradiation is possible without fine adjustment for workpieces having varying thickness. - Our lineup includes 100, 150, and 200 standard sizes ・Multiple mixed wavelength type designs are also available.
UV-LED for printing UniJet Series UV-LED for printing UniJet Series USHIO's UniJet series consists of modular UV light sources that are optimally designed and developed to satisfy the stringent demands of UV curing and printing. This ideal light source technology has been developed as an alternative to conventional lamp-based UV light sources, and are available with a variety of features, including water cooling, air cooling, and dimming. USHIO can provide variety of optimal solutions for cutomers demand by UniJet series.
9 results found. Displaying results1-9
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