Multipurpose exposure unit Deep UV Multilight
- MEMS, Electronic Components
- Liquid Crystal Display
- Printed Circuit Board and PKG
The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source.
It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications.
Please consult with us for light source variations up to 10 kW.
Surface modification and hydrophilic patterning, such as used in the printable electronics field
Uniform ultraviolet resin curing
Evaluation of various materials and more
|Light source||250 W super high-pressure UV lamp|
|Exposure area||135 mm dia.|
|Wavelength range||230 to 450 nm|
|Initial illuminance*||16 mW/cm2 or more|
|Illuminance uniformity||within ±5%|
|Main unit external dimensions (mm)||224W × 521D × 417H|
|Power supply external dimensions (mm)||180W × 300D × 360H|
|* Ushio's UV photodetector UVD-365PD converter|