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Full field projection aligner UX-4 Series
This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.
Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units.
Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.
Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life.
Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained.
Xenon short arc lamps (~500W)
These xenon short arc lamps are high-intensity point light sources filled with xenon gas, having a continuous spectrum similar to daylight in the visible to infrared range: an excellent light source for accurate color rendering. These lamps are used as light sources for spectroscopy, microscopy, solar simulators and various types of inspections.
Compact xenon lamp
Ushio's UXR™ series xenon lamps have been developed based on our proprietary optimized design, using ceramic and sapphire as primary components to provide excellent resistance to impact and pressure. Major lamp features are compact size and light weight, with an integrated mirror to efficiently extract the exceptional color rendering properties of the light while eliminating the need for troublesome optical axis alignment.
Also, Ushio's proprietary sapphire window structure makes possible lamp replacement without interruption.