Products
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Large field stepper UX-5 Series UX-7 Series | Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates. |
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Full field projection aligner UX-4 Series | This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner. |
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Contact/proximity aligners UX-3 Series | This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well. |
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Manual type contact/proximity aligners UX-1 Series | This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well. |
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Roll to roll lithography tool UFX Series | Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology. |
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UV photoresist curing systems Unihard | This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing and burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing. |
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Charge neutralization systems | Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing. |
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UV instant curing equipment Unicure System | High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required) |
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Spot UV irradiation units Spot Cure Series | The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions. |
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Super high-pressure UV lamps (~500W) | Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life. Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained. |
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Xenon short arc lamps (~500W) | These xenon short arc lamps are high-intensity point light sources filled with xenon gas, having a continuous spectrum similar to daylight in the visible to infrared range: an excellent light source for accurate color rendering. These lamps are used as light sources for spectroscopy, microscopy, solar simulators and various types of inspections. |
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Compact xenon lamp | Ushio's UXR™ series xenon lamps have been developed based on our proprietary optimized design, using ceramic and sapphire as primary components to provide excellent resistance to impact and pressure. Major lamp features are compact size and light weight, with an integrated mirror to efficiently extract the exceptional color rendering properties of the light while eliminating the need for troublesome optical axis alignment. Also, Ushio's proprietary sapphire window structure makes possible lamp replacement without interruption. |
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