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Full field projection aligner UX-4 Series

Full field projection aligner UX-4 Series

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Litho-Patterning
MEMS, Electronic Components
Semiconductors
Printed Circuit Board and PKG

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】

- Includes the world's number one super high-pressure UV lamp

- Our own irradiation optical system boasting a high degree of uniformity

- Unrivaled large-area projector lens

Features
Main applications
Case study
FAQ
Other

Mask-damage free

High productivity

3-dimensional exposure

Thick-film resist support

Proximity aligner mask diversion possible

MEMS
Crystal oscillators
SAW filters
RF devices
Sensors
Inkjet heads
Diodes
IGBT
Power semiconductors
Thyristors
MOS-FETs
LEDs
Power amps
MMICs
BAW filters
Acceleration sensors
Inductors
Passive components
Solar cells and more

Model list

Installed light source

Super high-pressure UV lamps (500W~35kW)

Note Regarding Exportation

This equipment (or technology) may be subject to security controls under the provisions of the Foreign Exchange and Foreign Trade Control Law, and in order to export the equipment or technology (or to conduct transactions for the purpose of providing the technology to a non-resident or foreign country), it may be necessary to obtain an export permit (or permission to implement service transactions) from the Minister of Economy, Trade and Industry. Be sure to contact us in advance for confirmation.