Super high-pressure UV lamps (500W~35kW)
- Litho-Patterning
- MEMS, Electronic Components
- Semiconductors
- Liquid Crystal Display
- Printed Circuit Board and PKG
Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust.
From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields.
We can also develop lamps tailored to new devices developed by your company.
■The Operating Manual is Here (requires member registration)
■The Frequently Asked Questions is Here
Photolithography light sources with optimized UV wavelengths
Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long lifespan.
A point light source to maximize optical system performance
Since the lamp's arc size is nearly that of a point light source, easy diffusion allows uniform collimation.
A wide range of lamp outputs is available for manufacturing applications including semiconductors, LCDs, color filters, OLEDs, touch panels and substrate printing.
A wide range of lamp sizes from small (500 W class) to ultra-large (35 kW class) is available for substrate printing (lithography) needs.
High-intensity illumination maximizes the performance of existing systems
When throughput of existing equipment needs improvement, just using a high-intensity lamp can ensure improved productivity.* Some system manufacturers' products may require modification."
Lamp development according to required wavelength
We develop lamps to best fit our customer's needs when developing new devices. Please contact us for more details.
UV lifespan characteristics
Spectral Distribution
