USHIO

光技術情報誌「ライトエッジ」No.30(2008年3月発行)

SPIE, 2005 International EUVL Symposium

(2005年10月)

Xe- and Sn-fueled Z-pinch EUV source
development aiming at HVM

Yusuke Teramoto*, Gohta Niimi*, Daiki Yamatani*, Yuki Joshima *, Kazunori Bessho*,
Takahiro Shirai*, Tetsu Takemura*, Toshio Yokota*, Hironobu Yabuta*, Khokan C. Paul**,
Kiyoyuki Kabuki*, Koji Miyauchi*, Mitsuru Ikeuchi*, Kazuaki Hotta*, Masaki Yoshioka*
and Hiroto Sato*
*Extreme Ultraviolet Lithography System Development Association (EUVA)
Hiratsuka Research and Development Center / Gotenba Branch
**Ushio Inc., Lamp Company, R&D Center
1-90 Komakado, Gotenba, Shizuoka 412-0038, Japan
Phone: +81-(0)550-87-3000, Fax: +81-(0)550-87-3200

This work has been supported by New Energy and Industrial Technology Development Organization (NEDO).

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