Development of high-power Sn-fueled
DPP EUV source for enabling HVM

Yusuke Teramoto, Takuma Yokoyama, Zenzo Narihiro, Daiki Yamatani, Kazunori Bessho,
Yuki Joshima, Takahiro Shirai, Shinsuke Mori, Hiroshi Mizokoshi, Gohta Niimi*, Tomonao
Hosokai*, Hironobu Yabuta, Kohkan C. Paul, Tetsu Takemura, Toshio Yokota, Kiyoyuki
Kabuki, Koji Miyauchi, Kazuaki Hotta, and Hiroto Sato
Extreme Ultraviolet Lithography System Development Association (EUVA)
Hiratsuka Research and Development Center / Gotenba Branch
*Ushio Inc., Lamp Company, R&D Center
1-90 Komakado, Gotenba, Shizuoka 412-0038, Japan
Phone: +81-(0)550-87-3000, Fax: +81-(0)550-87-3200