Waveplate on MEMS mirror surface Wave plate on MEMS mirror with Interference lithography technology
Waveplate on MEMS mirror surface Wave plate on MEMS mirror with Interference lithography technology
We have fabricated waveplate with metasurface on MEMS mirror surface.
The polarization of the input beam is rotated when it is reflected on the meta surface.
For example, when the half wave plate is integrated on the MEMS mirror,
it becomes a compact retardation device that can convert the TE polarized light to TM polarized light by reflected plane.
We have optimized the nanostructure of aluminum-based metal.
The mirror has a high reflectivity of 70% in the visible range(450-650nm) with nonpolarized light.
The mirror surface has a flat 180 degree retardance in the whole visible
range.
Therefore, the MEMS mirror has high functionality as a half wavelength plate.
Item | Details | |
---|---|---|
Optical Properties | wavelength | 450 nm~650 nm visible |
retardation | 180° ±20° | |
reflectance | TE:62% ±5%, TM:75%±5% (450 nm~650 nm) | |
Wafer | size | diameter200 mm(JEITA) |
thickness | 0.725 mm | |
MEMS Mirror | Mirror size | Major axis :1.0 mm, minor:0.8 mm |
Waveplate Effective Diameter | Major axis:0.9 mm, minor:0.7 mm | |
device size | 5.0 x 6.0 mm |