Interference lithography is a lithography technique that applying light contrast generated by light interference.
Because it uses light interference, the pattern created by this technology is finer than the wavelength of the light source.
Ushio can expose submicron patterns seamlessly and while adjusting curvature.
Application | Name |
---|---|
Lithography | Interference lithography tool |
Stepper, Aligner | |
Film Formation | ALD film deposition equipment |
Magnetron Sputtering | |
Etching | Plasma dry etcher |
Cutting | Dicing |
Cleaning | Two-fluid cleaning tool |
Supercritical cleaning tool | |
Coating/Development | Coater/developer |
Evaluation | SEM (scanning electron microscope) |
AFM (atomic force microscope) | |
Spectroscope | |
Ellipsometer |