Products
“Litho-Patterning“ search result
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Laser Diodes(LD) | With over 40 years of considerable experience in photonics industry, Ushio Inc., provides varies products selection in a wide wavelength range from violet to infrared for a broad range of applications such as display, medical, industrial tools(sensor and leveler), printer and more. |
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Large field stepper UX-5 Series UX-7 Series | Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates. |
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Full field projection aligner UX-4 Series | This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner. |
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Roll to roll lithography tool UFX Series | Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology. |
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EUV light source (for photo mask inspection and various technologies development) | The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies. |
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Multipurpose exposure unit Deep UV Multilight | The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications. |
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Multipurpose exposure unit Multilight | “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product. |
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Super high-pressure UV lamps (~500W) | Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life. Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained. |
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Super high-pressure UV lamps (500W~35kW) | Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. ■The Operating Manual is Here (requires member registration) ■The Frequently Asked Questions is Here |
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Deep UV lamps | These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps. They feature mean(middle) ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography. |
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