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EUV search result

Product name Product description Main applications and fields Wavelength
LED Chip / Package Ushio owns production process from Epitaxial to Package process to supply reliable LD/LED products for industrial market. From Violet to Red to Infrared, Ushio can propose the best device to your application from our wider variety of wavelength, power and packaging selection.
Care222 222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device Care222 is a new disinfecting light source that, even though not harmful to the skin or eyes of humans or animals, deactivates bacteria and viruses in the same manner as conventional ultraviolet sanitizers.
Large field stepper UX-5 Series UX-7 Series Large field stepper UX-5 Series UX-7 Series

Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

【Component Technology】
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

Full-field projection aligner UX-4 Series Full field projection aligner UX-4 Series

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Contact/proximity aligners UX-3 Series Contact/proximity aligners UX-3 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Manual type contact/proximity aligners UX-1 Series Manual type contact/proximity aligners UX-1 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Roll-to-roll lithography tool UFX Series Roll to roll lithography tool UFX Series

Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

EUV light source (for photo mask inspection and various technologies development) EUV light source (for photo mask inspection and various technologies development) The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies.
Excimer lamps/Excimer irradiation unit Excimer lamps/Excimer irradiation unit Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. * * * * For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact : Sales Department 5, Sales Division, Light Source Business Division TEL: +81-3-5657-1016 / E-Mail: science-shinki@ushio.co.jp
UV photoresist curing systems Unihard® UV photoresist curing systems Unihard This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing and burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing.
Charge neutralization systems Charge neutralization systems Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing.
UV instant curing equipment Unicure® System UV instant curing equipment Unicure System High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required)
Spot UV irradiation units Spot Cure® Series Spot UV irradiation units Spot Cure Series The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions.
Light source unit for scientific use Optical Modulex Light source unit for scientific use Optical Modulex This desktop light source unit provides simple collimated IR, UV and visible light, and is ideal for spectrometry and solar cell evaluation. All models have adjustment-free optical lamp axes for highly collimated, high-power light source experiments on the desktop.
Light source unit for inspection illumination Optical Modulex Light source unit for inspection illumination Optical Modulex Equipped with a high-intensity UV lamp, it provides high-precision collimated irradiation indispensable for inspection tasks. The desk-type light source unit has a track record of actual results for over 15 years as ideal for visual inspection of glass, film and lenses (and is the inspection light source recommended by the Glass Manufacturer's Association).
Multipurpose exposure unit Deep UV Multilight Multipurpose exposure unit Deep UV Multilight The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications.
Multi-purpose exposure unit (Multilight) Multipurpose exposure unit Multilight “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product.

Super high-pressure UV lamps (to 500 W) Super high-pressure UV lamps (~500W) Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life. Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained.
Super high-pressure UV lamps (500 W to 35 kW) Super high-pressure UV lamps (500W~35kW) Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. The Operating Manual is Here (requires member registration)
Xenon short arc lamps (to 500 W) Xenon short arc lamps (~500W) These xenon short arc lamps are high-intensity point light sources filled with xenon gas, having a continuous spectrum similar to daylight in the visible to infrared range: an excellent light source for accurate color rendering. These lamps are used as light sources for spectroscopy, microscopy, solar simulators and various types of inspections.
Lamps for data projectors Lamps for data projectors Based on super high-pressure UV lamps, these compact, high-intensity, flicker-free lamps exhibit high reliability. The lamps support high-performance projectors in various applications including business, education and home theater markets.
86 results found. Displaying results22-42
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