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Liquid Crystal Display search result

Product name Product description Main applications and fields Wavelength
Excimer Lighting Power Supply Modules These are power supply modules for barrier discharge lamps. High efficiency is realized by adopting our own pulse lighting method instead of a sine wave. Compact, highly reliable transformers realize stable high voltage. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Atmospheric-Pressure Plasma Power Supply Modules These power supply modules are ideal for generating atmospheric pressure plasma. They are customizable for various plasma heads. Moreover, they can be parallel-connected to handle higher power levels. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Long-Arc Lamp Lighting Power Supplies These lighting power supplies cover a wide output-voltage range to correspond with various long-arc lamps. We have designed a multi-connect system of power modules, with a lineup of three models providing 4 kW, 8 kW and 18 kW output with a common system control unit. The power modules are digitally controlled by a built-in DSP, achieving high efficiency even at high output by adopting a phase-shift type full-bridge circuit system. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Ultra-High-Pressure UV Lamp Power Supplies These lighting power supplies are for our ultra-high-pressure UV lamps. Our lineup of lighting power supplies provides 100 W to 35 kW for ultra-high-pressure UV lamps. At 12 kW, it is possible to control high output current exceeding 200 A. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Power Supply Repair Services Various power supplies are accepted for repairs. We have repair facilities in China, Korea and Taiwan, enabling local repairs without requiring power supplies to be returned to Japan when problems occur. Please feel free to consult us during maintenance and repair. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Lineup of Inverter Prototypes for Experiment and Evaluation We have lined up inverter prototypes that are compatible with a wide range of power and size excimer light 172nm/222nm lamps. It is designed to change output power, frequency, etc. and is optimal for experiments and evaluations. We offer this lineup with quick delivery. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form
Large field stepper UX-5 Series UX-7 Series Large field stepper UX-5 Series UX-7 Series

Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

【Component Technology】
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

Full-field projection aligner UX-4 Series Full field projection aligner UX-4 Series

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Contact/proximity aligners UX-3 Series Contact/proximity aligners UX-3 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Manual type contact/proximity aligners UX-1 Series Manual type contact/proximity aligners UX-1 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Roll-to-roll lithography tool UFX Series Roll to roll lithography tool UFX Series

Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Excimer lamps/Excimer irradiation unit Excimer lamps/Excimer irradiation unit Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. * * * * For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact : Sales Department 5, Sales Division, Light Source Business Division TEL: +81-3-5657-1016 / E-Mail: science-shinki@ushio.co.jp
UV instant curing equipment Unicure® System UV instant curing equipment Unicure System High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required)
Spot UV irradiation units Spot Cure® Series Spot UV irradiation units Spot Cure Series The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions.
Light source unit for inspection illumination Optical Modulex Light source unit for inspection illumination Optical Modulex Equipped with a high-intensity UV lamp, it provides high-precision collimated irradiation indispensable for inspection tasks. The desk-type light source unit has a track record of actual results for over 15 years as ideal for visual inspection of glass, film and lenses (and is the inspection light source recommended by the Glass Manufacturer's Association).
Multipurpose exposure unit Deep UV Multilight Multipurpose exposure unit Deep UV Multilight The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications.
Multi-purpose exposure unit (Multilight) Multipurpose exposure unit Multilight “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product.

Super high-pressure UV lamps (500 W to 35 kW) Super high-pressure UV lamps (500W~35kW) Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. The Operating Manual is Here (requires member registration)
Deep UV lamps Deep UV lamps These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps. They feature far-ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.
Halogen lamp heaters Halogen lamp heaters These halogen lamp heaters were developed to efficiently extract the infrared light from the halogen lamp, with more than 85% of the input power converted into heat, resulting in a very efficient energy source. Heating by halogen lamp is rich in flexibility and controllability, with excellent characteristics no other heat source can provide. Ushio's heat processing systems are used in various industrial fields such as electronic device manufacturing processes like semiconductors and LCDs, and heating of auto parts and resin materials such as CFRP.
Flash lamp annealer Flash lamp annealer Flash lamp annealing allows very short heating processes as quick as one millisecond. UV to visible wavelength light emitted from the flash lamp can concentrate heat on a substrate (material) surface so that the thermal influence on the underlying film or substrate can be extremely small compared with conventional heat sources. This millisecond surface heat treatment is becoming an essential technology for future device developments such as zero diffusion of semiconductor implanted layers and thermal budget reduction. Flash lamp heating is also used to produce reactions such as crystallization, bonding, peeling, decomposition and curing. These characteristics are effectively applied in various research and development applications such as Si wafers, SiC wafers, glass, plastic films and other flexible substrates, as well as in production (manufacturing) line applications. We welcome requests for experimental demonstrations. Please feel free to contact us.
32 results found. Displaying results1-21
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