Products
“Semiconductors“ search result
Product name | Product description | Main applications and fields | Wavelength | ||
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Excimer Lighting Power Supply Modules | These are power supply modules for barrier discharge lamps. High efficiency is realized by adopting our own pulse lighting method instead of a sine wave. Compact, highly reliable transformers realize stable high voltage. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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LED Module Lighting Devices | These lighting devices for LD/LED are system products that integrate the control system and LED drivers. Control lighting operation of bulk connected LD/LEDs. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Single-Output LED Drivers | These single-output LED drivers were developed mainly for UV curing (printing, semiconductor photolithography, and etc.). Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Multi-Output LED Driver | With a total of 15 output channels assignable in up to three groups, this multi-output LED driver can control lighting and dimming of each group. For example, it is possible to individually control the UV-LEDs for each g-, h-, and i-line to cure ink for printing, so that each lights under optimal mix conditions. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Long-Arc Flash Lamp Lighting Power Supply | This power supply charges ultra-high-voltage capacitors for long-arc momentary-output flash lamps. Ideal for chargers in flash lamp annealing (FLA) equipment. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Short Pulse Discharge Power Supply | This power supply charges ultra-high-voltage capacitors. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Power Supply Repair Services | Various power supplies are accepted for repairs. We have repair facilities in China, Korea and Taiwan, enabling local repairs without requiring power supplies to be returned to Japan when problems occur. Please feel free to consult us during maintenance and repair. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Lineup of Inverter Prototypes for Experiment and Evaluation | We have lined up inverter prototypes that are compatible with a wide range of power and size excimer light 172nm/222nm lamps. It is designed to change output power, frequency, etc. and is optimal for experiments and evaluations. We offer this lineup with quick delivery. Technology Introduction Page For more details about this technology, please inquire at this page Inquiry Form |
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Large field stepper UX-5 Series UX-7 Series | Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates. |
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Full field projection aligner UX-4 Series | This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner. |
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Contact/proximity aligners UX-3 Series | This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well. |
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Manual type contact/proximity aligners UX-1 Series | This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well. |
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Roll to roll lithography tool UFX Series | Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology. |
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EUV light source (for photo mask inspection and various technologies development) | The semiconductor industry's continuous advance toward higher performance, smaller size and lower power consumption has spurred the development of ultra-miniaturized exposure technology. EUV (extreme ultraviolet) exposure technology at 13.5 nm wavelength is one of the most promising next-generation technologies. USHIO is conducting EUV light source development for photo mask inspection and for various other technical applications utilizing our experience in the study and development of our EUV Xe DPP and EUV Sn LDP light source technologies. |
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Excimer lamps/Excimer irradiation unit | Excimer VUV light is the very high-energy light generated by lamps containing noble gases or noble-gas hydride compounds. Externally applying high-energy electrons to a sealed lamp containing a noble gas or noble gas hydride compound generates intense plasma discharge (dielectric barrier discharge). This plasma features high-energy electron content, and can be extinguished instantly. The plasma discharge instantly excites the atoms of the discharge gas (noble gas) to their excimer (Xe) state (high-energy orbital atoms form excimer excited molecules). The excimer-specific spectrum is emitted when atoms return from this excimer state to their original condition (ground state). This emission is called VUV light. * * * * For inquiries regarding "222 nm ultraviolet (UV-C) light antibacterial and viral inactivation device," please contact : Sales Department, XEFL BU, Light Source Business Division TEL: +81-3-5657-1016 / E-Mail: care222_sales@ushio.co.jp |
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UV photoresist curing systems Unihard | This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing and burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing. |
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Charge neutralization systems | Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing. |
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UV instant curing equipment Unicure System | High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required) |
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Spot UV irradiation units Spot Cure Series | The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions. |
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Multipurpose exposure unit Deep UV Multilight | The Deep UV Multi-light is a light source unit optimized for the deep UV wavelength region from 230 to 330 nm while maintaining the same basic structure of the Multi-light series that has a good track record as a uniform, collimated light source. It can be applied as a surface modification light source, as a light source for evaluation of various photochemical reactions, as well as for lithographic applications. |
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Multipurpose exposure unit Multilight | “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product. |
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