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Product name Product description Main applications and fields Wavelength
Mold Type LED Our "epitex" series LED covers all wavelengths in the UV, visible and IR (Infrared) spectra, from 365nm to 1650nm based on reliable technologies over 25 years. You can choose a suitable wavelength product for your application from our selection, which is available at every 20nm (below 1000nm) and every 100nm (over 1000nm).
Mold Type LED Our "epitex" series LED covers all wavelengths in the UV, visible and IR (Infrared) spectra, from 365nm to 1650nm based on reliable technologies over 25 years. You can choose a suitable wavelength product for your application from our selection, which is available at every 20nm (below 1000nm) and every 100nm (over 1000nm).
High Power LED Our "epitex" series LED covers all wavelengths in the UV, visible and IR (Infrared) spectra, from 365nm to 1650nm based on reliable technologies over 25 years. You can choose a suitable wavelength product for your application from our selection, which is available at every 20nm (below 1000nm) and every 100nm (over 1000nm).
Large field stepper UX-5 Series UX-7 Series Large field stepper UX-5 Series UX-7 Series

Ushio provides specialized steppers for cutting-edge packaging applications employed in servers and PCs, and in portable devices such as smart phones and tablet PCs. The stepper is intended for package substrates using a stage corresponding to the panel size and Ushio's proprietary large-area projection lens technology cultivated from many years of expertise in light source and optical technology. High productivity is achieved while realizing the high resolution and overlay accuracy required for the latest packaging substrates.

【Component Technology】
- Includes the world's best-selling super high-pressure UV lamp
- Ushio's irradiation optical system boasts a high degree of uniformity
- Unrivaled large-area projector lens

Full-field projection aligner UX-4 Series Full field projection aligner UX-4 Series

This projection aligner uses our unique large area projector lens technology, light source and other optical technologies developed by Ushio over many years. Provides one-shot exposure of up to 8-inch wafers without touching the mask. Large depth of field enables proper exposure of non-flat wafers, achieving higher productivity and yield not possible with a proximity aligner.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

Contact/proximity aligners UX-3 Series Contact/proximity aligners UX-3 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Manual type contact/proximity aligners UX-1 Series Manual type contact/proximity aligners UX-1 Series

This mask aligner uses light source and optical technologies developed by Ushio over many years. This exposure device supports not only ihg rays, but the deep UV range as well.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity

Roll-to-roll lithography tool UFX Series Roll to roll lithography tool UFX Series

Currently Ushio's proximity/projection exposure systems for flexible substrates have a track record of over 800 units. Highly efficient high-resolution exposure is achieved by a projector lens that makes full use of our specially developed high-output lamp and our established reputation in optical system technology.

【Component Technology】
- Includes the world's number one super high-pressure UV lamp
- Our own irradiation optical system boasting a high degree of uniformity
- Unrivaled large-area projector lens

UV photoresist curing systems Unihard® UV photoresist curing systems Unihard This ultraviolet irradiation device is used for photoresist curing in LSI manufacturing lines. Equipped with a super high-pressure UV lamp and an excimer lamp, this system is used for various applications such as enhancing plasma resistance during dry etching, photoresist outgassing and burn prevention during ion implantation, neutralizing electrical charge, removing stress and low-k curing.
Charge neutralization systems Charge neutralization systems Strong, deep ultraviolet irradiation neutralizes electric charge on EPROM and Flash memory. Neutralizes electric charge that can be problematic for plasma processing.
UV instant curing equipment Unicure® System UV instant curing equipment Unicure System High-power, compact UV curing and drying equipment achieves low-temperature processing. Lamps and other components can be selected according to the UV intensity and irradiation area required for the intended purpose. Instruction manuals here (Registration required)
LED spot UV irradiation unit SPL-2 LED spot UV irradiation unit SPL-2 This spot cure series LED type has over 30 years of actual results. By taking advantage of our optical technology developed up to now, we provide solutions to problems that could not be solved with conventional LED types. We propose products tailored to your needs.
Spot UV irradiation units Spot Cure® Series Spot UV irradiation units Spot Cure Series The "Spot Cure Series" takes advantage of our light system technology cultivated for over 30 years, in pursuit of ease of use and environmental considerations. We offer a wide variety of lens and unit options to suit line and workpiece conditions.
Light source unit for scientific use Optical Modulex Light source unit for scientific use Optical Modulex This desktop light source unit provides simple collimated IR, UV and visible light, and is ideal for spectrometry and solar cell evaluation. All models have adjustment-free optical lamp axes for highly collimated, high-power light source experiments on the desktop.
Multi-purpose exposure unit (Multilight) Multipurpose exposure unit Multilight “Multilight” provides an even light source for a variety of uses, including precision pattern exposure, pattern exposure for semi-conductor elements, and wafer exposure.
*This is The USHIOLIGHTING INC's product.

Super high-pressure UV lamps (to 500 W) Super high-pressure UV lamps (~500W) Ushio's super high-pressure UV lamps have been developed to effectively utilize three ultraviolet wavelengths (436, 405 and 365 nm) as high-intensity light sources with stable irradiance and long life. Since the lamp's arc size is nearly that of a point light source, the light can be readily converged and diffused by the optical system, and uniform illuminance distribution is easily obtained.
Super high-pressure UV lamps (500 W to 35 kW) Super high-pressure UV lamps (500W~35kW) Jointly developed with device manufacturers in response to their increasingly diverse needs, these lithographic UV lamps have earned high acclaim as well as user trust. From our broad lineup of 500 W to 35 kW class lamps, we can offer optimum irradiation solutions to bolster your productivity and improve yields. We can also develop lamps tailored to new devices developed by your company. The Operating Manual is Here (requires member registration)
Xenon short arc lamps (to 500 W) Xenon short arc lamps (~500W) These xenon short arc lamps are high-intensity point light sources filled with xenon gas, having a continuous spectrum similar to daylight in the visible to infrared range: an excellent light source for accurate color rendering. These lamps are used as light sources for spectroscopy, microscopy, solar simulators and various types of inspections.
Compact xenon lamp Compact xenon lamp Ushio's UXR™ series xenon lamps have been developed based on our proprietary optimized design, using ceramic and sapphire as primary components to provide excellent resistance to impact and pressure. Major lamp features are compact size and light weight, with an integrated mirror to efficiently extract the exceptional color rendering properties of the light while eliminating the need for troublesome optical axis alignment. Also, Ushio's proprietary sapphire window structure makes possible lamp replacement without interruption.
Deep UV lamps Deep UV lamps These are high-intensity point light source mercury vapor-filled lamps based on xenon lamps. They feature far-ultraviolet radiation in the 230 to 320 nm wavelength range, used for short-wavelength photochemical reactions, UV curing and lithography.
UV-LED uniform line illumination light source UniLine UV-LED uniform line illumination light source UniLine - Supporting multiple wavelengths, this production line light source is capable of high-intensity, highly uniform UV irradiation. - The proprietary optical design supports various irradiation distances from 10 to 150 mm. - Irradiation length can be customized according to workpiece size and application.
24 results found. Displaying results1-21
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